Determination method, storage medium and information processing apparatus
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United States of America Patent
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Jan 24, 2017
Grant Date -
Jan 10, 2013
app pub date -
Jun 27, 2012
filing date -
Jul 5, 2011
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Abstract
The present invention provides a determination method of determining exposure conditions of an exposure apparatus including an illumination optical system which illuminates a mask, and a projection optical system which projects a pattern of the mask onto a substrate, the method including a step of setting an illumination parameter for a light intensity distribution formed on a pupil plane of the illumination optical system, and an aberration parameter for an aberration of the projection optical system, and a step of determining a value of the illumination parameter and a value of the aberration parameter so that an image performance of an optical image of the pattern of the mask satisfies an evaluation criterion set for a target pattern to be formed on an image plane of the projection optical system.
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