Lithography system and method of manufacturing articles
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United States of America Patent
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Jan 31, 2017
Grant Date -
Apr 28, 2016
app pub date -
Oct 21, 2015
filing date -
Oct 27, 2014
priority date (Note) -
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Abstract
At least one method of manufacturing articles and at least one lithography system are provided herein. A lithography system according to an exemplary embodiment of the present disclosure includes a drawing apparatus that includes a plurality of optical systems and draws a pattern on a substrate with beams having been respectively shaped by the plurality of optical systems, and a transmission unit configured to select pattern data to be used by the drawing apparatus from a plurality of types of pattern data commonly used by the plurality of optical systems and configured to transmit the selected pattern data to the drawing apparatus. The pattern data is a set of data including a plurality of sub pattern data, and a width of a stripe-shaped drawing region corresponding to one sub pattern data piece is equivalent to a length obtainable by dividing a drawing width of the beams by an integer value.
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