Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition

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United States of America Patent

PATENT NO 9563121
APP PUB NO 20140342275A1
SERIAL NO

14452093

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Abstract

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An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group has been substituted with a group represented by the following General Formula (1) (in the formula, M11 represents a single bond or a divalent linking group; Q11 represents an alkyl group, a cycloalkyl group, or an aryl group).

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inasaki, Takeshi Haibara-gun, JP 25 97
Kawabata, Takeshi Haibara-gun, JP 104 1204
Tsuchihashi, Toru Haibara-gun, JP 41 227
Tsuchimura, Tomotaka Haibara-gun, JP 102 599

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