Method for forming a metal silicide using a solution containing gold ions and fluorine ions

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United States of America Patent

PATENT NO 9564333
APP PUB NO 20150380254A1
SERIAL NO

14766389

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Abstract

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A subject matter of the invention is a process for the formation of nickel silicide or of cobalt silicide, comprising the stages consisting in:

    exposing the surface of the silicon-comprising substrate with an aqueous solution comprising from 0.1 mM to 10 mM of gold ions and from 0.6 M to 3.0 M of fluorine ions for a duration of between 5 seconds and 5 minutes,depositing by an electroless route, on the activated substrate, a layer essentially composed of nickel or of cobalt,applying a rapid thermal annealing at a temperature of between 300° C. and 750° C., so as to form the nickel silicide or the cobalt silicide.

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Patent Owner(s)

  • ALCHIMER

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mevellec, Vincent Chaville, FR 16 57
Suhr, Dominique Chatenay Malabry, FR 10 28

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