Polishing composition and method for producing polished article

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United States of America Patent

PATENT NO 9566685
SERIAL NO

14769377

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Abstract

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This invention provides a polishing composition comprising an abrasive, a water-soluble polymer and water. The water-soluble polymer comprises a polymer A having an adsorption ratio of lower than 5% and a polymer B having an adsorption ratio of 5% or higher, but lower than 95% based on a prescribed adsorption ratio measurement. Herein, the polymer B is selected from polymers excluding hydroxyethyl celluloses.

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Patent Owner(s)

  • FUJIMI INCORPORATED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Tansho, Hisanori Kiyosu, JP 14 37
Tsuchiya, Kohsuke Kiyosu, JP 35 84

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