Deposition apparatus and cleansing method using the same

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United States of America Patent

PATENT NO 9567672
SERIAL NO

14834505

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Abstract

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Provided is a deposition apparatus including a connection channel connecting a gas inflow channel and a gas outflow channel so as to increase cleaning efficiency by providing a portion of cleaning gas to the dead space of the gas inflow channel and controlling a flow of a cleaning gas.

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Patent Owner(s)

  • ASM IP HOLDING B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jang, Hyun Soo Daejeon, KR 48 6103
Jeong, Sang-Jin Cheonan, KR 23 130
Kim, Dae Youn Daejeon, KR 39 6489
Kim, Young Hoon Cheonan, KR 205 5558
Lee, Jeong Ho Seoul, KR 208 6114

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