Substrate susceptor and deposition apparatus having same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Feb 14, 2017
Grant Date -
May 16, 2013
app pub date -
Mar 16, 2011
filing date -
Jul 28, 2010
priority date (Note) -
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Abstract
The present disclosure relates to a deposition apparatus used to manufacture a semiconductor device including a process chamber; a substrate susceptor installed in the process chamber and including a plurality of concentrically arranged stages on which substrates are positioned; a plurality of members for supplying reaction gas; a member for supplying purge gas; a spray member including a plurality of baffles for independently spraying reaction gas and purge gas, supplied from the plurality of members supplying reaction gas and the member supplying purge gas, on the entirety of the treating surfaces of the substrate, in positions corresponding respectively to the substrates positioned on the stages; and a driving unit for rotating the substrate susceptor or the spray member in order for the baffles of the spray member to sequentially revolve each of the plurality of substrates positioned on the stages.
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