Method for forming metal oxide film, metal oxide film and apparatus for forming metal oxide film

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United States of America Patent

PATENT NO 9574271
APP PUB NO 20120112187A1
SERIAL NO

13383766

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Abstract

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The present method of forming a metal oxide film can increase production efficiency while maintaining the low resistance of the metal oxide film. The present method of forming a metal oxide film includes first misting a solution containing a metallic element and ethylenediamine; meanwhile, heating a substrate; and then, supplying the misted solution onto a first main surface of the substrate.

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Patent Owner(s)

  • KYOTO UNIVERSITY;TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujita, Shizuo Kyoto, JP 24 163
Kameyama, Naoki Kyoto, JP 30 35
Kawaharamura, Toshiyuki Kochi, JP 12 9
Orita, Hiroyuki Tokyo, JP 32 38
Shirahata, Takahiro Tokyo, JP 21 140
Yoshida, Akio Tokyo, JP 109 1344

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