System for generating extreme ultra violet light
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United States of America Patent
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Feb 21, 2017
Grant Date -
Nov 24, 2016
app pub date -
Aug 1, 2016
filing date -
Nov 16, 2011
priority date (Note) -
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Abstract
A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.
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