Developing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9581907
APP PUB NO 20150104747A1
SERIAL NO

14572677

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.

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Patent Owner(s)

Patent OwnerAddress
SCREEN SEMICONDUCTOR SOLUTIONS CO LTDKYOTO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harumoto, Masahiko Kyoto, JP 44 328
Hisai, Akihiro Kyoto, JP 19 245
Kuroda, Takuya Kyoto, JP 16 224
Sugiyama, Minoru Kyoto, JP 37 292
Yamaguchi, Akira Kyoto, JP 336 4767

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