Pellicle inspection apparatus

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United States of America Patent

PATENT NO 9588421
APP PUB NO 20150293460A1
SERIAL NO

14683560

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Abstract

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Provided with a pellicle inspection apparatus that inspects a pellicle film of a mask provided with a pellicle and used in EUV lithography. The pellicle inspection apparatus includes: an illumination optical system that projects a converging illuminating beam toward the pellicle film;

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Patent Owner(s)

Patent OwnerAddress
LASERTEC CORPORATION2-10-1 SHIN-YOKOHAMA KOHOKU-KU YOKOHAMA KANAGAWA 222-8552

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kusunose, Haruhiko Yokohama, JP 34 385
Tajima, Atsushi Yokohama, JP 6 26
Takehisa, Kiwamu Yokohama, JP 37 138

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