Polishing composition

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United States of America Patent

PATENT NO 9593259
APP PUB NO 20150299517A1
SERIAL NO

14440688

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Abstract

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A polishing composition of the present invention contains: a polyvinyl alcohol resin having a 1,2-diol structure in its side chain, the polyvinyl alcohol resin being a copolymer of a monomer represented by Formula (1) below and a vinyl ester monomer; an organic acid; and abrasive grains whose surfaces are chemically modified so as to have a minus zeta potential on the surfaces in a solution with a pH of 2.0 or more and to have no isoelectric point:

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Patent Owner(s)

Patent OwnerAddress
NITTA HAAS INCORPORATEDOSAKA-SHI OSAKA 556-0022

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matsushita, Takayuki Kyoto, JP 17 134

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