Direct liquid deposition

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United States of America Patent

PATENT NO 9593407
APP PUB NO 20130099020A1
SERIAL NO

13655501

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Abstract

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Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP1, STEP1′). In one variant the liquid precursor material is distilled (STEP2), the resultant liquid coating substance is vaporized (STEP3) and ejected through a vapor distribution nozzle arrangement (7) into a vacuum recipient (3) and onto substrate 5 to be coated. Alternatively, the liquid precursor material is directly vaporized (STEP3′). From the two-component vapor coating substance vapor is applied to substrate 5′ to be coated. In this variant separation of solvent vapor and coating substance vapor is performed especially downstream vaporizing (STEP2′).

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Patent Owner(s)

Patent OwnerAddress
EVATEC AG9477 TRÜBBACH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gaechter, Bruno Ruethi, CH 4 8
Ravelli, Fabio Antonio Buchs, CH 3 12
Voser, Stephan Sevelen, CH 16 89

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