Lithography apparatus, determination method, and method of manufacturing article
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United States of America Patent
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Mar 28, 2017
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app pub date -
May 18, 2015
filing date -
May 21, 2014
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Abstract
The present invention provides a lithography apparatus which forms a pattern on a substrate, the apparatus comprising a stage holding the substrate and being movable; a measurement unit configured to irradiate a side surface of the stage with light and measure a position of the stage, a generation unit configured to generate a flow of gas in a space where the stage moves, a detection unit configured to detect respective positions of sample shot regions formed on the substrate, and a control unit configured to determine an order of detecting the sample shot regions by the detection unit such that detection by the detection unit is performed sequentially from a sample shot region closer to the measurement unit with respect to sample shot regions located on a downstream side of the flow of the gas from a center of the substrate.
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