Target shaping

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United States of America Patent

PATENT NO 9611537
SERIAL NO

13032922

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Abstract

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A target for a physical vapor deposition system includes a top, a bottom, and a base. The base essentially is defined by the surface of the target to be sputtered. A first, inner ring and a second, outer ring extend from the base. Each ring has an inner side and an outer side, wherein sputtering is concentrated on the outer sides by means of a magnet arrangement adjacent to the target.

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Patent Owner(s)

Patent OwnerAddress
EVATEC AGHAUPTSTRASSE 1A TRÜBBACH 9477

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kadlec, Stanislav Prague, CZ 20 244
Weichart, Jürgen Balzers, LI 12 57

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