Composition for metal plating comprising suppressing agent for void free submicron feature filling

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United States of America Patent

PATENT NO 9617647
APP PUB NO 20120118750A1
SERIAL NO

13384732

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Abstract

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A composition comprising at least one source of metal ions and at least one additive obtainable by reacting a polyhydric alcohol comprising at least 5 hydroxyl functional groups with at least a first alkylene oxide and a second alkylene oxide from a mixture of the first alkylene oxide and the second alkylene oxide or a third alkylene oxide, a second alkylene oxide, and a first alkylene oxide in aforesaid sequence, the third alkylene oxide having a longer alkyl chain than the second alkylene oxide and the second alkylene oxide having a longer alkyl chain than the first alkylene oxide.

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Patent Owner(s)

Patent OwnerAddress
BASF SEGERMANY'S RHINE RIVER IN LUDWIGSHAFEN LUDWIGSHAFEN RHINELAND-PALATINATE

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Emnet, Charlotte Stuttgart, DE 33 122
Haag, Alexandra Hemhofen, DE 10 62
Mayer, Dieter Darmstadt, DE 60 684
Raether, Roman Benedikt Speyer, DE 44 243
Roeger-Goepfert, Cornelia Schwetzingen, DE 27 164

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