Surface relief microstructures, related devices and method of making them

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United States of America Patent

PATENT NO 9618839
APP PUB NO 20120027998A1
SERIAL NO

13148849

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Abstract

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The present invention relates to a method for the replication of a patterned surface relief microstructure, comprising the steps of generation of a first layer with a patterned surface relief microstructure, generation of a master, by copying the microstructure of the first layer into a second layer, thereby involving at least one dry or wet etching step, characterized by an additional step, in which the microstructure of the master is brought into contact with a replica material, such that the microstructure of the master is reproduced in the replica.

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Patent Owner(s)

Patent OwnerAddress
ROLIC AGZUG

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ibn-Elhaj, Mohammed Allschwil, CH 17 137
Martz, Julien Mulhouse, FR 4 18
Seiberle, Hubert Weil am Rhein, DE 60 1275
Wernet, Wolfgang Neuenburg, DE 94 834

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