Substrate cleaning apparatus for cleaning a lower surface of a substrate

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United States of America Patent

PATENT NO 9623450
APP PUB NO 20130258300A1
SERIAL NO

13756959

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A rotating shaft is provided to extend downward from the inside of a spin motor. A plate supporting member is attached to the lower end of the rotating shaft. A spin plate is supported in a horizontal attitude by the plate supporting member. A substrate holding mechanism is provided at the periphery on the spin plate. The lower end of an annular member is formed to be opposite to an annular region extending along the periphery on the upper surface of the substrate held by a spin chuck. A distance between the upper surface of the substrate and the lower surface of the spin plate is larger than a distance between the upper surface of the substrate and the lower end of the annular member.

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Patent Owner(s)

Patent OwnerAddress
SCREEN SEMICONDUCTOR SOLUTIONS CO LTDKYOTO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishiyama, Koji Kyoto, JP 77 536

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