Chemical mechanical polishing pad composite polishing layer formulation

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United States of America Patent

PATENT NO 9630293
APP PUB NO 20160375545A1
SERIAL NO

14751385

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Abstract

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A chemical mechanical polishing pad is provided containing: a polishing layer having a polishing surface; wherein the polishing layer comprises a first continuous non-fugitive polymeric phase and a second non-fugitive polymeric phase; wherein the first continuous non-fugitive polymeric phase has a plurality of periodic recesses; wherein the plurality of periodic recesses are occupied with the second non-fugitive polymeric phase; wherein the first continuous non-fugitive polymeric phase has an open cell porosity of ≦6 vol %; wherein the second non-fugitive polymeric phase contains an open cell porosity of ≧10 vol %; and, wherein the polishing surface is adapted for polishing a substrate.

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Patent Owner(s)

  • DOW GLOBAL TECHNOLOGIES LLC;ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Brugarolas, Brufau Teresa Philadelphia, US 15 44
Hendron, Jeffrey James Elkton, US 21 61
Jacob, George C Newark, US 34 94
Kozhukh, Julia Bear, US 23 54
Lugo, Diego Newark, US 8 42
Miller, Jeffrey B West Chester, US 29 171
Qian, Bainian Newark, US 51 316
Stack, Marc R Middletown, US 6 30
Tran, Tony Quan Bear, US 14 49

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