Substrate cleaving under controlled stress conditions

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United States of America Patent

PATENT NO 9640711
APP PUB NO 20160276522A1
SERIAL NO

15167291

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A thickness of material may be detached from a substrate along a cleave plane, utilizing a cleaving process controlled by a releasable constraint plate. In some embodiments this constraint plate may comprise a plate that can couple side forces (the “P-plate”) and a thin, softer compliant layer (the “S-layer”) situated between the P-plate and the substrate. In certain embodiments a porous surface within the releasable constraint plate and in contact to the substrate, allows the constraint plate to be secured to the substrate via a first pressure differential. Application of a combination of a second pressure differential within a pre-existing cleaved portion, and a linear force to a side of the releasable constraint plate bound to the substrate, generates loading that results in controlled cleaving along the cleave plane.

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Patent Owner(s)

Patent OwnerAddress
SILICON GENESIS CORPORATIONSAN JOSE CA 95134

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chow, Yi-Lei Los Altos, US 3 33
Henley, Francois Aptos, US 6 476
Lamm, Al Suisun City, US 3 33

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