High-frequency power supply device

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United States of America Patent

PATENT NO 9648719
SERIAL NO

14825325

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Abstract

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A high-frequency input voltage and a high-frequency input current to a series resonant circuit are detected by a voltage detection unit and a current detection unit, respectively, and plasma input power is detected by a plasma input power detection unit based on the detected high-frequency input voltage and high-frequency input current. By directly detecting the plasma input power in this manner, the plasma input power may be accurately controlled regardless of the state of a plasma-generating gas or an analysis sample. Also, use of a switching circuit including a semiconductor device allows an inexpensive configuration compared with a configuration where a vacuum tube or the like is used.

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Patent Owner(s)

Patent OwnerAddress
SHIMADZU CORPORATIONKYOTO-SHI KYOTO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Habu, Toshiya Kyoto, JP 17 29

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