Method for forming stair-step structures

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United States of America Patent

PATENT NO 9673057
SERIAL NO

14665815

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Abstract

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A method for forming a stair-step structure in a substrate within a plasma processing chamber is provided. An organic mask is formed over the substrate. The organic mask is trimmed with a vertical to lateral ratio of less than 0.8, wherein the trimming simultaneously forms a deposition over the organic mask. The substrate is etched. The steps of trimming the organic mask and etching the substrate are cyclically repeated a plurality of times.

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Patent Owner(s)

  • LAM RESEARCH CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bae, In Deog San Ramon, US 5 43
Fu, Qian Pleasanton, US 66 937

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