Target element types for process parameter metrology

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United States of America Patent

PATENT NO 9678421
SERIAL NO

14795549

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Abstract

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Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.

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Patent Owner(s)

Patent OwnerAddress
KLA-TENCOR CORPORATIONONE TECHNOLOGY DRIVE MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kandel, Daniel Aseret, IL 72 1631
Levinski, Vladimir Migdal HaEmek, IL 106 1375
Yoel, Feler Haifa, IL 1 23

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