Method of fabricating rare-earth doped piezoelectric material with various amounts of dopants and a selected C-axis orientation

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United States of America Patent

PATENT NO 9679765
SERIAL NO

14161564

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Abstract

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A method of fabricating a rare-earth element doped piezoelectric material having a first component, a second component and the rare-earth element. The method includes: providing a substrate; initially flowing hydrogen over the substrate; after the initially flowing of the hydrogen over the substrate, flowing the first component to form the rare-earth element doped piezoelectric material over a surface of a target, the target comprising the rare-earth metal in a certain atomic percentage; and sputtering the rare-earth element doped piezoelectric material from the target on the substrate.

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Patent Owner(s)

  • AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bader, Stefan Fort Collins, US 51 1808
Kaitila, Jyrki Riemerling, DE 22 1403
Larson,, III John D Palo Alto, US 27 667

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