Photomask and method for manufacturing photomask

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United States of America Patent

PATENT NO 9690188
APP PUB NO 20150378252A1
SERIAL NO

14753580

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Abstract

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A method for manufacturing a photomask is provided. The method includes providing a flexible substrate, forming a plurality of microstructures on the flexible substrate, coating the flexible substrate with a shading material to form a shading layer on the substrate, and solidifying the shading layer which is a single layer.

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Patent Owner(s)

  • NATIONAL CHENG KUNG UNIVERSITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsieh, Heng Tainan, TW 1 3
Hsieh, Yi-Ta Hsinchu, TW 6 6
Lee, Yung-Chun Tainan, TW 18 29
Wu, Chun-Ying Taichung, TW 18 340
Yan, Jhih-Nan Pingtung County, TW 1 3

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