Apparatus for treating substrate and method for discharging supercritical fluid

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United States of America Patent

PATENT NO 9691638
SERIAL NO

13537960

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Abstract

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Provided are an apparatus for treating a substrate and a method for discharge a supercritical fluid, and more particularly, an apparatus for treating a substrate using a supercritical fluid and a method for discharging the supercritical fluid using the same. The apparatus for treating the substrate includes a container for providing a supercritical fluid, a vent line through which the supercritical fluid is discharged from the container, and a freezing prevention unit disposed in the vent line to prevent the supercritical fluid from being frozen.

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Patent Owner(s)

Patent OwnerAddress
SEMES CO LTD77 4SANDAN 5-GIL JIKSAN-EUP SEOBUK-GU CHEONAN-SI CHUNGCHEONGNAM-DO 31040

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Yong Hyun Suwon-si, KR 19 158
Kim, Kibong Paju-si, KR 11 79
Kim, Woo Young Cheonan-si, KR 66 370
Park, Jeong Seon Cheonan-si, KR 3 30

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