Silicon buried digit line access device and method of forming the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9691773
APP PUB NO 20150123280A1
SERIAL NO

14069396

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Importance

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Abstract

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An access device includes a plurality of first digit lines (DL) trenches extending along a first direction, buried digit lines between each DL trench, second and third trenches separating the digit lines, a filling material filling the digit line trenches comprising airgaps in each second trench, a plurality of word line (WL) trenches extending along a second direction, metal word lines deposited on the walls of the word line trenches, a filling material filling the word line trenches.

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Patent Owner(s)

  • NANYA TECHNOLOGY CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Heineck, Lars Garden City, US 33 267
Surthi, Shyam Boise, US 78 689

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