Methods and systems for stabilizing filaments in a chemical vapor deposition reactor
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United States of America Patent
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Jul 11, 2017
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app pub date -
Dec 19, 2012
filing date -
Dec 19, 2012
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Abstract
In various embodiments, systems, methods, and apparatus are provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor system. A system includes a base plate having a plurality of electrical connections, a pair of filaments extending from the base plate, and a stabilizer connecting the pair of filaments. Each filament is in electrical contact with, and defines a conductive path between, the two electrical connections. A method of stabilizing the filaments includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electrically insulating material.
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