Method for manufacturing tungsten-based capacitor element

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United States of America Patent

PATENT NO 9704652
APP PUB NO 20170047169A1
SERIAL NO

15306233

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Abstract

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The present invention provides a method for producing a capacitor element having good LC characteristics, wherein, after a chemical conversion process to form a dielectric layer on the surface layer of an anode body obtained by forming a powder mainly comprising tungsten, followed by sintering, a semiconductor layer and a conductor layer are sequentially formed on the dielectric layer; an etching process is conducted before forming the dielectric layer to remove a natural oxide film formed on the surface layer on the outer surface and on the surface inside the pores of the anode body so as to adjust the film thickness to a range of 0.5 to 5.0 nm; and the chemical conversion process is conducted at a temperature from −4 to 18° C. for 7 to 110 minutes after reaching a predetermined voltage.

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Patent Owner(s)

  • SHOWA DENKO K.K.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Naito, Kazumi Tokyo, JP 136 579
Tamura, Katsutoshi Tokyo, JP 13 67

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