Crack-tolerant photovoltaic cell structure and fabrication method

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United States of America Patent

PATENT NO 9705013
SERIAL NO

14936900

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Abstract

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After forming an absorber layer containing cracks over a back contact layer, a passivation layer is formed over a top surface of the absorber layer and interior surfaces of the cracks. The passivation layer is deposited in a manner such that that the cracks in the absorber layer are fully passivated by the passivation layer. An emitter layer is then formed over the passivation layer to pinch off upper portions of the cracks, leaving voids in lower portions of the cracks.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINES CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hekmatshoartabari, Bahman White Plains, US 389 1813
Li, Ning White Plains, US 711 4085
Saenger, Katherine L Ossining, US 127 2896

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