Method of manufacturing polishing pad having detection window and polishing pad having detection window
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United States of America Patent
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Jul 18, 2017
Grant Date -
Feb 27, 2014
app pub date -
Nov 1, 2013
filing date -
Dec 31, 2009
priority date (Note) -
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Abstract
A polishing pad having a detection window and a method of manufacturing the polishing pad are provided. A dummy detection window is pre-disposed in a mold. A polishing layer precursor is filled into the mold, and then a solidifying process is performed to form a polishing layer, wherein the polishing layer and the dummy detection window are separable completely. The polishing layer and the dummy detection window are separated from each other so as to form a detection opening in the polishing layer. The detection opening can alternatively be formed in a mold having a protrusion structure to replace the dummy detection window. A detection window precursor is filled into the detection opening, and then a solidifying process is performed to form a detection window.
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