Atomic layer deposition method for coating a substrate surface using successive surface reactions with multiple precursors
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United States of America Patent
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Jul 18, 2017
Grant Date -
Jun 16, 2016
app pub date -
Jun 26, 2014
filing date -
Jun 27, 2013
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Abstract
Methods for providing one or more coating layers on a surface of a substrate by successive surface reactions of at least a first and second precursor are provided. The methods generally include supplying the first precursor from a first precursor nozzle and the second precursor from a second precursor nozzle to the surface of the substrate, and moving the substrate relative to at least one of the first and second precursor nozzle. The methods can further include subjecting only one or more first limited sub-areas of the surface of the substrate to the first and second precursor by cooperation of supplying the first and second precursor and simultaneously moving the substrate relative to at least one of the first and second precursor nozzle.
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