Photomask blank and method for manufacturing photomask blank

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9709885
APP PUB NO 20170023855A1
SERIAL NO

15284098

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Abstract

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A method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate includes forming the silicon-containing inorganic film such that a surface has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent, the silicon-containing inorganic film being an SiO film or an SiON film and serving as a hard mask film.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ikeda, Akira Jyoetsu, JP 154 847
Inazuki, Yukio Jyoetsu, JP 113 794
Kaneko, Hideo Jyoetsu, JP 98 438
Kawai, Yoshio Jyoetsu, JP 163 2636
Sakurada, Toyohisa Jyoetsu, JP 17 123
Watanabe, Satoshi Jyoetsu, JP 523 4776
Yoshii, Takashi Jyoetsu, JP 64 945

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