Electron beam plasma source with reduced metal contamination

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9721760
SERIAL NO

13912488

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • APPLIED MATERIALS, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Carducci, James D Sunnyvale, US 109 3566
Collins, Kenneth S San Jose, US 308 25148
Dorf, Leonid San Jose, US 71 1268
Lane, Steven Porterville, US 68 1096
Misra, Nipun San Jose, US 18 517
Monroy, Gonzalo Antonio San Francisco, US 17 627
Ramaswamy, Kartik San Jose, US 347 17329
Rauf, Shahid Pleasanton, US 149 4883

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Feb 1, 2025
11.5 Year Payment $7400.00 $3700.00 $1850.00 Feb 1, 2029
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00