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Abstract

A resist underlayer film-forming composition including: (A) component: an isopoly or heteropoly acid, or a salt thereof, or a combination thereof; and (B) component: polysiloxan, poly hafnium oxide or zirconium oxide, or a combination thereof, wherein an amount of the (A) component is 0.1 to 85% by mass of a total amount of the (A) component and the (B) component; and polysiloxan is a hydrolysis-condensation product of hydrolyzable silane of Formula (1):

description='In-line Formulae' end='lead'R¹_aR²_bSi(R³)_4−(a+b)  Formula (1)description='In-line Formulae' end='tail'

and a hydrolyzable silane whose (a+b) is 0 is contained in a proportion of 60 to 85 mol % of a total hydrolyzable silane in Formula (1); the poly hafnium oxide is a hydrolysis-condensation product of hydrolyzable hafnium of Formula (2):

description='In-line Formulae' end='lead'Hf(R⁴)₄  Formula (2)description='In-line Formulae' end='tail'

and the zirconium oxide is a hydrolysis-condensation product of hydrolyzable zirconium of Formula (3) or Formula (4):

description='In-line Formulae' end='lead'Zr(R⁵)₄  Formula (3)description='In-line Formulae' end='tail'

description='In-line Formulae' end='lead'ZrO(R⁶)₂  Formula (4)description='In-line Formulae' end='tail'

or a hydrolysis-condensation product of a combination thereof.

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First Claim