Device member including cavity and method of producing the device member including cavity

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United States of America Patent

PATENT NO 9726563
SERIAL NO

14430321

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Abstract

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A device member including a cavity, includes a base member, an interlayer, an upper layer, an opening portion, and a gas-permeable sealing layer. The base member includes a first semiconductor. The interlayer is formed on the base member and is non-conductive. The upper layer is formed on the interlayer and includes a second semiconductor. The opening portion is formed at the upper layer. The gas-permeable sealing layer is formed to seal the opening portion formed at the upper layer. The cavity is formed by removing the interlayer with an etching gas that penetrates through the sealing layer.

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Patent Owner(s)

Patent OwnerAddress
KABUSHIKI KAISHA SAGINOMIYA SEISAKUSHO55-5 WAKAMIYA 2-CHOME NAKANO-KU TOKYO 165-0033
THE UNIVERSITY OF TOKYO3-1 HONGO 7-CHOME BUNKYO-KU TOKYO 1138654 ?1138654

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujita, Hiroyuki Tokyo, JP 290 3516
Mitsuya, Hiroyuki Sayama, JP 23 94
Toshiyoshi, Hiroshi Tokyo, JP 29 169

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