Measurement device, measurement apparatus, and method
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United States of America Patent
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Aug 8, 2017
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app pub date -
Oct 5, 2015
filing date -
Apr 8, 2013
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Abstract
A metal film of a measurement device including a transparent dielectric substrate is irradiated with first light from a transparent dielectric substrate side, an optical electric field enhanced by an optical electric field enhancing effect of a localized plasmon induced to a surface of the metal film by the irradiation is generated, light emitted from the transparent dielectric substrate side is detected, a specimen installed on a surface of a metal fine concavo-convex structure layer and a matrix agent are irradiated with second light from a side opposite to the side of the irradiation with the first light in a state where a voltage is applied to the metal fine concavo-convex structure layer through a voltage application electrode, an analysis target substance for mass spectrometry in the specimen is desorbed from the surface by the irradiation, and the desorbed analysis target substance is detected.
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