Charged particle beam writing apparatus and charged particle beam writing method
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United States of America Patent
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Aug 15, 2017
Grant Date -
Oct 13, 2016
app pub date -
Apr 1, 2016
filing date -
Apr 10, 2015
priority date (Note) -
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status (Latency Note)
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Abstract
A charged particle beam writing apparatus includes a circuitry to set, when a charged particle beam is deflected to move between plural small regions by a deflector, plural first mesh regions obtained by virtually dividing a chip region into regions by length and width sizes same as those of each of the plural small regions; determine whether a shot figure having been assigned exists in each of the plural first mesh regions; a circuitry to perform, for the plural first mesh regions, merging of two or more adjacent first mesh regions; a circuitry to measure, for each of plural second mesh regions each obtained by merging, the number of first mesh regions each having been determined that an assigned shot figure exists therein; and a circuitry to generate a map for each chip, where measured number of first mesh regions with the shot figure is defined as a map value.
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