Polishing pad

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United States of America Patent

PATENT NO 9737972
SERIAL NO

14650294

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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The purpose of the present invention is to provide a polishing pad that hardly generates scratches on a surface of a subject to be polished. This polishing pad is characterized in that: the polishing pad is provided with a polishing layer having a polishing region and a light-transmitting region; the light-transmitting region includes a surface layer positioned on the pad surface side, and at least one soft layer laminated under the surface layer, and the soft layer has a hardness lower than that of the surface layer.

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Patent Owner(s)

  • ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nakamura, Kenji Osaka, JP 547 8087

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