Microwave plasma reactors and substrates for synthetic diamond manufacture
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United States of America Patent
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Aug 22, 2017
Issued Date -
Mar 5, 2015
app pub date -
Sep 11, 2014
filing date -
Dec 23, 2010
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Abstract
The present disclosure relates to substrates for use in microwave plasma reactors. Certain substrates include a cylindrical disc of a carbide forming refractory metal having a flat growth surface on which CVD diamond is to be grown and a flat supporting surface opposed to said growth surface. The cylindrical disc may have a diameter of 80 mm or more. The growth surface may have a flatness variation no more than 100 mm The supporting surface may have a flatness variation no more than 100 mm.
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