Scalable CVD film and nanomaterial synthesis
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United States of America Patent
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Aug 22, 2017
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Jun 9, 2015
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Jun 13, 2014
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Abstract
The present invention relates to tools and system designs for chemical vapor deposition (CVD) systems and CVD synthesis used to deposit one or more thin film layers onto a flexible substrate or to grow nano-structured materials on large area flexible substrates and, more particularly, to scalable CVD coating and nanostructure manufacturing including CVD thin films and nano-structured materials such as nanotubes, nanowires and nanosheets.
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