Patterning device support and lithographic apparatus

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United States of America Patent

PATENT NO 9740112
SERIAL NO

14436070

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Abstract

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A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

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Patent Owner(s)

  • ASML HOLDING N.V.;ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Burbank, Daniel Nathan Ridgefield, US 13 55
Harris, Duncan Fairfield, US 2 113
Roux, Stephen S New Fairfield, US 1 2
Schuster, Mark Josef Fairfield, US 11 56
Sinharoy, Arindam Furlong, US 7 8
Van, Damme Jean-Philippe Xavier Wezembeek-Oppem, BE 9 18
Ward, Christopher Charles Somerville, US 17 73

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