Method for forming polysilicon film

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United States of America Patent

PATENT NO 9741562
SERIAL NO

15116974

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Abstract

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Provided is a method for forming a silicon film, and more particularly, to a method for forming a polycrystalline silicon film including pretreatment process in a process for forming a silicon film. According to an embodiment of the present invention, a method for forming a polycrystalline silicon film by annealing a amorphous silicon film deposited on a base, the method includes a pretreatment process of allowing a pretreatment gas including at least one of N, C, O and B to flow.

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Patent Owner(s)

Patent OwnerAddress
EUGENE TECHNOLOGY CO LTD42 CHUGYE-RO YANGJI-MYEON CHEOIN-GU YONGIN-SI GYEONGGI-DO 17156

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Sung-Kil Yongin-si, KR 11 47
Choi, Ho Min Yongin-si, KR 8 5
Gwon, Hyuk Lyong Siheung-si, KR 1 0
Jung, Woo Duck Suwon-si, KR 14 39
Kim, Ki Ho Asan-si, KR 69 773
Lee, Kang-Wook Uijeongbu-si, KR 96 2376
Lee, Koon Woo Yongin-si, KR 3 0
Oh, Wan Suk Yongin-si, KR 8 110
Park, Seong Jin Seoul, KR 79 250
Shin, Seung-Woo Hwaseong-si, KR 40 494

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