Hydrogen free amorphous silicon as insulating dielectric material for superconducting quantum bits

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United States of America Patent

PATENT NO 9741921
SERIAL NO

15352639

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Abstract

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A hydrogen-free amorphous dielectric insulating film having a high material density and a low density of tunneling states. The film is prepared by deposition of a dielectric material on a substrate having a high substrate temperature Tsub under high vacuum and at a controlled low deposition rate. In one embodiment, the film is amorphous silicon while in another embodiment the film is amorphous germanium.

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Patent Owner(s)

Patent OwnerAddress
THE GOVERNMENT OF THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVYONE LIBERTY CTR 875 NORTH RANDOLPH ST SUITE 1425 CHIEF OF NAVAL RESEARCH OFFICE OF COUNSEL (ATTN CODE OOCCIP) ARLINGTON VA 22203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abernathy, Matthew R Washington, US 3 2
Hellman, Frances Berkeley, US 3 44
Jernigan, Glenn G Waldorf, US 8 38
Liu, Xiao Fairfax, US 182 512
Metcalf, Thomas H Washington, US 5 10
Queen, Daniel R Silver Spring, US 4 6

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