Symmetrical inductively coupled plasma source with symmetrical flow chamber
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United States of America Patent
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Aug 29, 2017
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N/A
app pub date -
Nov 1, 2012
filing date -
Jul 20, 2012
priority date (Note) -
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Abstract
A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workpiece support. A grid may be included for masking spatial effects of the struts from the processing region.
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International Classification(s)
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- H01J:ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B01J:CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, CO....
- H05H:PLASMA TECHNIQUE
- C23F:NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM S....
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