High-resolution in-line metrology for roll-to-roll processing operations
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United States of America Patent
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Aug 29, 2017
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app pub date -
Feb 21, 2016
filing date -
Feb 23, 2015
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Abstract
A substrate is tested with an interferometer in-line in a roll-to-roll processing operation to detect defects and exclude them from further processing. A tilt is introduced in the illumination path of the interferometer to allow detection of best fringes in a selected measurement field of view (FOV) that is smaller than the camera FOV in the direction transverse to the fringes. At each acquisition frame, the measurement FOV is shifted to track the best-fringe position within the camera field of view based on irradiance acquired at the previous step. As a result, the system is able to accommodate substrate flutter and roller runout and maintain focus on the substrate that allows precise identification of defects and their isolation for subsequent processing.
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