Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 9746788
SERIAL NO

15293009

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Importance

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Abstract

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A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.

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First Claim

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Patent Owner(s)

  • ASML HOLDING N.V.;ASML NETHERLANDS B.V.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Belfroid, Stefan Philip Christiaan Delft, NL 19 559
Cox, Henrikus Herman Marie Eindhoven, NL 70 2049
Donders, Sjoerd Nicolaas Lambertus Vught, NL 248 8208
Graaf, Roelof Frederik De Veldhoven, NL 3 98
Hoogendam, Christiaan Alexander Westerhoven, NL 205 9819
Kate, Nicolaas Ten Almkerk, NL 33 1045
Kemper, Nicolaas Rudolf Eindhoven, NL 95 1630
Mertens, Jeroen Johannes Sophia Maria Duizel, NL 160 6214
Meulen, Frits Van Der Eindhoven, NL 9 547
Smeulers, Johannes Petrus Maria Zwijndrecht, NL 21 704
Teunissen, Franciscus Johannes Herman Maria Rotterdam, NL 34 493
Toorn, Jan-Gerard Cornelis Van Der Eindhoven, NL 5 151
Verhagen, Martinus Cornelis Maria Valkenswaard, NL 51 1290
Vogel, Herman Sandy Hook, US 42 951

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