Substrate treating apparatus and substrate treating method

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United States of America Patent

PATENT NO 9748117
APP PUB NO 20130108975A1
SERIAL NO

13665169

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Abstract

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Provided is a substrate treating apparatus. The substrate treating apparatus includes a chamber, a support member disposed within the chamber to support a substrate, and an exhaust member for exhausting a gas within an inner space of the chamber to the outside of the chamber. A trap space for collecting fumes contained in the gas is defined in the exhaust member.

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Patent Owner(s)

Patent OwnerAddress
SEMES CO LTD77 4SANDAN 5-GIL JIKSAN-EUP SEOBUK-GU CHEONAN-SI CHUNGCHEONGNAM-DO 31040

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kang, Unkyu Cheonan-si, KR 2 4
Kim, Sungun Cheonan-si, KR 6 119

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