Substrate treating apparatus
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United States of America Patent
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Aug 29, 2017
Issued Date -
N/A
app pub date -
Jul 30, 2014
filing date -
Jul 31, 2013
priority date (Note) -
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Abstract
Provided is a substrate treating apparatus. The substrate treating apparatus includes a treating container having an opened upper portion, a substrate heating unit heating a substrate disposed in the treating container while supporting the substrate, and a treating solution supply unit supplying a treating solution onto the substrate disposed on the substrate heating unit. The substrate heating unit includes a rotatable chuck stage on which the substrate is placed, a rotation part having a hollow shape, the rotation part being coupled to the chuck stage to rotate the chuck stage, and a heat generation part disposed in the chuck stage.
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