Facility and method for depositing a width adjustable film of ordered particles onto a moving substrate
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United States of America Patent
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Sep 5, 2017
Grant Date -
May 29, 2014
app pub date -
Jul 10, 2012
filing date -
Jul 13, 2011
priority date (Note) -
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Abstract
A facility for depositing a film of ordered particles onto a moving substrate, the facility configured to allow deposition, onto the substrate, of a film of ordered particles escaping from a particle outlet of a transfer zone having a first width. The facility further includes an accessory device in a form of a deposit head, provided to seal the particle outlet and configured to allow the deposition, onto the substrate, of a film of ordered particles escaping from an end of a particle transfer channel of the deposit head, the end having a second width strictly lower than the first width.
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